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waveguide_width
float32
0.5
2
waveguide_height
float32
200
600
cladding_material
stringclasses
3 values
cladding_thickness
float32
1
5
deposition_method
stringclasses
3 values
etch_method
stringclasses
3 values
sidewall_roughness
float32
0.5
5
annealing_params
stringclasses
4 values
wavelength
float32
1.5k
1.6k
polarization
stringclasses
2 values
input_power
float32
-10
10
temperature
float32
20
80
bend_radius
float32
20
200
device_length
float32
1
50
insertion_loss
float32
0.53
26.5
propagation_loss
float32
0.1
5
coupling_efficiency_input
float32
40
90
coupling_efficiency_output
float32
40
90
scattering_loss
float32
0.01
0.5
effective_index
float32
1.5
2
mode_confinement_factor
float32
0.7
0.95
batch_id
stringclasses
50 values
data_source
stringclasses
2 values
measurement_method
stringclasses
4 values
uncertainty
float32
0.01
0.2
0.663
527.219971
Air
1.08
LPCVD
RIE
0.6
900C_1hr
1,578.670044
TE
-7.61
65.510002
150.869995
32.889999
3.687
0.584
89.57
52.610001
0.392
1.595
0.827
BATCH_37
Measurement
OTDR
0.151
1.246
532
Air
3.35
Sputtering
ICP
1.62
900C_1hr
1,542.949951
TM
-6.01
57.709999
68.370003
29.1
10.55
3.389
79.949997
45.619999
0.023
1.557
0.824
BATCH_23
Synthetic
microring_Q
0.098
0.755
323.630005
SiO2
4.45
PECVD
RIE
3.83
1000C_1hr
1,508.900024
TM
-5.94
55.830002
143.550003
5.08
2.599
2.965
68.089996
81.32
0.025
1.635
0.838
BATCH_3
Synthetic
cut-back
0.082
1.67
506.220001
Air
3.75
Sputtering
ICP
4.27
900C_1hr
1,506.5
TE
3.98
53.459999
191.970001
35.470001
9.543
2.383
77.510002
50.450001
0.168
1.692
0.759
BATCH_15
Synthetic
ring_resonance
0.136
1.968
289.790009
Polymer
2.55
Sputtering
RIE
2.82
900C_1hr
1,540.959961
TM
-6.23
23.58
192.440002
4.58
3.121
3.458
65.75
56.990002
0.272
1.589
0.909
BATCH_5
Measurement
microring_Q
0.045
1.654
343.589996
Polymer
1.06
LPCVD
RIE
4.31
No_Anneal
1,526.72998
TM
-7.26
56.779999
133.520004
31.85
2.375
0.176
72.239998
54.950001
0.051
1.839
0.822
BATCH_26
Measurement
cut-back
0.087
0.901
275.109985
Air
1.34
LPCVD
ICP
1.74
900C_1hr
1,554.849976
TM
-6.17
53.060001
96.949997
14.65
2.957
1.016
86.150002
82.730003
0.38
1.818
0.796
BATCH_22
Measurement
cut-back
0.167
1.428
593.599976
Air
3.81
Sputtering
RIE
2.7
900C_1hr
1,564.02002
TE
0.47
49.560001
79.089996
12.82
2.827
0.679
86.540001
89.75
0.292
1.653
0.752
BATCH_44
Measurement
OTDR
0.053
1.483
387.709991
Air
3.84
LPCVD
ICP
1.69
900C_1hr
1,517.170044
TM
-2.77
52.43
155.720001
21.35
6.03
2.194
59.939999
83.949997
0.087
1.726
0.92
BATCH_19
Measurement
ring_resonance
0.023
1.208
465.76001
SiO2
3.43
LPCVD
RIE
1.64
900C_3hr
1,583.689941
TE
-5.33
66.389999
162.309998
12.77
4.787
2.329
63.139999
72.309998
0.191
1.885
0.798
BATCH_38
Synthetic
OTDR
0.071
1.719
424.01001
Air
4.59
PECVD
RIE
3.43
900C_3hr
1,542.089966
TM
3.85
40.459999
24.190001
45.599998
7.551
1.4
60.169998
80.260002
0.482
1.614
0.921
BATCH_22
Measurement
cut-back
0.142
1.926
438.769989
Polymer
4.43
PECVD
ICP
2.51
No_Anneal
1,537.27002
TE
-4.16
59.709999
26.59
47.009998
16.572001
3.102
49.040001
84.419998
0.253
1.644
0.732
BATCH_9
Synthetic
OTDR
0.102
0.752
588.710022
SiO2
1.4
PECVD
Wet Etch
1.26
No_Anneal
1,564.569946
TM
-8.65
72.010002
159.610001
28.65
10.18
2.87
44.169998
63.25
0.48
1.899
0.927
BATCH_6
Measurement
microring_Q
0.169
0.82
239
Polymer
3.9
PECVD
Wet Etch
3.89
900C_1hr
1,522.359985
TE
2.35
68.089996
63.959999
5.41
3.645
3.915
59.560001
62.549999
0.032
1.729
0.764
BATCH_45
Synthetic
microring_Q
0.147
0.532
264.359985
SiO2
1.06
LPCVD
ICP
4.16
No_Anneal
1,538.790039
TM
-6.77
26.950001
29.5
39.240002
9.282
2.039
81.150002
50.400002
0.042
1.674
0.87
BATCH_17
Measurement
OTDR
0.174
1.616
311.799988
Air
3.02
PECVD
Wet Etch
0.58
1000C_1hr
1,533.48999
TM
-1.8
44.93
38.720001
11.32
6.845
4.536
58.540001
70.260002
0.112
1.883
0.736
BATCH_28
Measurement
OTDR
0.094
0.766
380.559998
SiO2
2.7
LPCVD
ICP
0.95
900C_1hr
1,569.859985
TE
-3.71
46.419998
67.790001
34.990002
5.328
1.099
74.089996
78.68
0.185
1.848
0.733
BATCH_13
Measurement
OTDR
0.12
0.905
210.830002
Polymer
2.37
PECVD
Wet Etch
2.31
900C_3hr
1,511.420044
TE
-5.16
30.030001
72.230003
45.41
10.023
1.861
84.330002
51.959999
0.269
1.544
0.935
BATCH_45
Measurement
microring_Q
0.143
1.038
395.690002
Polymer
4.41
Sputtering
RIE
4.19
900C_3hr
1,545.48999
TM
-6.64
28.200001
145.679993
29.219999
12.599
4.11
78.93
40.639999
0.197
1.762
0.787
BATCH_10
Measurement
OTDR
0.018
1.753
536.22998
SiO2
3.65
PECVD
RIE
2.48
900C_3hr
1,520.920044
TE
-5.57
22.15
166.029999
19.709999
5.816
2.107
46.34
40.91
0.229
1.775
0.84
BATCH_50
Measurement
ring_resonance
0.115
1.386
233.630005
Polymer
2.65
PECVD
RIE
3.36
900C_1hr
1,557.48999
TM
0.68
70.279999
168.199997
28.6
14.47
4.685
40.099998
47.540001
0.315
1.52
0.794
BATCH_17
Measurement
microring_Q
0.066
1.447
562.539978
SiO2
2.97
Sputtering
ICP
4.11
900C_3hr
1,537.369995
TE
-3.08
28.389999
114.779999
34.169998
6.386
1.703
89.260002
57.91
0.395
1.593
0.806
BATCH_21
Measurement
OTDR
0.13
1.671
388.019989
Polymer
1.76
Sputtering
RIE
3.17
900C_3hr
1,597.01001
TE
-5.56
72.940002
152.470001
10.36
2.171
0.175
45.73
60.23
0.034
1.595
0.881
BATCH_38
Measurement
cut-back
0.051
0.979
545.440002
SiO2
4.72
PECVD
Wet Etch
4.57
900C_3hr
1,570.650024
TE
-7.76
35.34
196.009995
30.34
14.377
4.535
79.809998
40.639999
0.414
1.79
0.839
BATCH_3
Synthetic
cut-back
0.072
1.072
325.029999
Polymer
3.89
LPCVD
ICP
0.96
No_Anneal
1,583.369995
TE
3.48
69.870003
101.300003
9.86
2.53
1.478
56.23
52.209999
0.105
1.586
0.773
BATCH_41
Synthetic
microring_Q
0.025
0.884
295.269989
Air
3.87
LPCVD
RIE
2.76
900C_3hr
1,599.800049
TM
2.98
56.400002
60.869999
8.69
1.268
0.485
65.370003
80.220001
0.382
1.913
0.92
BATCH_34
Measurement
microring_Q
0.113
1.281
331.369995
SiO2
2.94
PECVD
Wet Etch
4.91
No_Anneal
1,561.01001
TE
3.28
64.940002
130.889999
8.25
5.135
4.553
81.150002
84.099998
0.322
1.972
0.921
BATCH_34
Synthetic
microring_Q
0.142
1.631
383.079987
Polymer
2.15
LPCVD
Wet Etch
0.53
900C_1hr
1,547.300049
TM
7.7
65.099998
80.769997
16.83
6.746
2.957
89.260002
49.779999
0.453
1.505
0.758
BATCH_11
Measurement
OTDR
0.04
1.803
548.700012
SiO2
2.68
PECVD
Wet Etch
3.27
900C_1hr
1,560.680054
TE
-8.88
76.68
46.380001
26.610001
3.666
1.096
82.879997
54.369999
0.282
1.918
0.793
BATCH_26
Synthetic
cut-back
0.098
0.528
555.169983
Polymer
3.68
PECVD
Wet Etch
1.21
900C_3hr
1,568.060059
TE
6.06
42.57
159.779999
47.860001
2.108
0.146
64.089996
71.540001
0.143
1.578
0.776
BATCH_48
Synthetic
cut-back
0.098
1.875
503.809998
Polymer
1.6
PECVD
Wet Etch
4.4
No_Anneal
1,594.579956
TM
-4.11
40.77
101.089996
10.32
1.92
0.705
41.119999
40.450001
0.354
1.678
0.788
BATCH_5
Synthetic
microring_Q
0.102
1.602
201.820007
Air
1.91
LPCVD
Wet Etch
1.91
No_Anneal
1,557.27002
TE
0.45
24.879999
166.630005
31.26
6.71
1.552
43.57
68.669998
0.205
1.666
0.94
BATCH_25
Measurement
microring_Q
0.175
1.168
447.029999
Air
2.79
PECVD
Wet Etch
3.23
900C_3hr
1,563.390015
TE
9.07
47.52
78.480003
9.37
5.298
3.57
74.209999
53.889999
0.49
1.664
0.946
BATCH_15
Measurement
cut-back
0.092
1.62
282.649994
Polymer
4.73
LPCVD
ICP
1.54
No_Anneal
1,513.719971
TM
-8.44
41.830002
65.160004
20.110001
8.411
3.787
73.360001
83.290001
0.443
1.895
0.762
BATCH_35
Synthetic
ring_resonance
0.177
0.635
395.959991
Air
2.55
Sputtering
ICP
1.45
1000C_1hr
1,588.410034
TM
7.54
35.77
75.910004
13.4
3.487
1.463
84.099998
46.860001
0.13
1.949
0.927
BATCH_37
Measurement
ring_resonance
0.17
1.161
317.609985
Air
3.34
Sputtering
ICP
2.52
1000C_1hr
1,577.560059
TM
-8.94
40.93
108.82
16.139999
7.945
3.885
70.260002
53.07
0.283
1.854
0.737
BATCH_23
Measurement
cut-back
0.061
1.223
451.700012
Air
4.56
PECVD
Wet Etch
2.23
1000C_1hr
1,573.170044
TE
-4.45
72.410004
77.089996
25.129999
4.678
1.458
77.059998
89.879997
0.354
1.54
0.757
BATCH_2
Synthetic
ring_resonance
0.097
1.973
555.840027
Polymer
4.59
Sputtering
Wet Etch
0.78
No_Anneal
1,502.280029
TM
8.91
30.860001
32.889999
20.559999
1.917
0.267
78.580002
51.48
0.203
1.696
0.803
BATCH_20
Measurement
cut-back
0.075
1.141
576.820007
SiO2
3.53
PECVD
ICP
3.92
No_Anneal
1,569.25
TM
5.95
58.950001
184.729996
38.700001
2.554
0.152
53.049999
66.419998
0.495
1.627
0.788
BATCH_29
Synthetic
microring_Q
0.095
0.908
371
Air
1.52
LPCVD
RIE
1.57
1000C_1hr
1,546.209961
TE
2.18
55.150002
167.919998
19.040001
3.871
1.568
75.339996
70.879997
0.28
1.592
0.745
BATCH_39
Measurement
cut-back
0.138
0.628
290.130005
SiO2
4.1
LPCVD
ICP
3.52
1000C_1hr
1,519.849976
TM
-7.74
20.85
198.839996
31.27
4.341
1.12
80.889999
51.130001
0.231
1.719
0.896
BATCH_46
Synthetic
OTDR
0.124
1.246
271.179993
Air
4.19
Sputtering
RIE
4.91
1000C_1hr
1,502.930054
TM
0.3
62.57
50.43
26.82
3.095
0.543
42.82
46.709999
0.242
1.793
0.929
BATCH_3
Synthetic
OTDR
0.017
1.32
268.75
Air
4.53
LPCVD
Wet Etch
0.91
900C_1hr
1,539.079956
TM
-1.45
26.58
25.26
8.39
3.79
3.226
88.32
55.709999
0.012
1.884
0.926
BATCH_11
Synthetic
OTDR
0.046
0.905
368.75
Polymer
2.7
PECVD
ICP
2.89
900C_1hr
1,530.439941
TM
1.8
66.940002
188.220001
1.82
1.523
1.494
43.669998
61.959999
0.487
1.824
0.777
BATCH_26
Synthetic
ring_resonance
0.045
1.298
554.599976
Polymer
4.72
LPCVD
ICP
3.15
900C_3hr
1,515.930054
TE
2.17
68.910004
179.789993
13.54
7.321
4.727
47.84
49.549999
0.046
1.984
0.884
BATCH_14
Synthetic
microring_Q
0.115
1.353
377.029999
Air
1.07
LPCVD
ICP
2.48
900C_1hr
1,516.76001
TE
7.52
24.700001
88.519997
27.879999
2.903
0.568
82.220001
70.339996
0.323
1.958
0.733
BATCH_43
Measurement
ring_resonance
0.024
1.703
220.949997
SiO2
2
LPCVD
RIE
3.71
900C_1hr
1,587.069946
TE
9.45
39.209999
198.389999
33.5
8.01
2.031
60.91
70.120003
0.139
1.956
0.933
BATCH_34
Synthetic
cut-back
0.159
1.297
221.399994
SiO2
1.62
LPCVD
Wet Etch
0.85
1000C_1hr
1,559.319946
TE
-7.58
23.08
195.100006
44.040001
12.671
2.699
89.879997
82.190002
0.098
1.587
0.91
BATCH_16
Synthetic
microring_Q
0.154
1.35
326.619995
SiO2
2.21
LPCVD
Wet Etch
3.34
No_Anneal
1,504.290039
TE
-3.45
61.439999
41.970001
11.15
5.127
2.828
71.190002
58.02
0.403
1.507
0.73
BATCH_17
Synthetic
microring_Q
0.193
1.124
420.109985
Air
2.04
PECVD
RIE
1.7
1000C_1hr
1,598.22998
TE
6.07
78.260002
47.990002
47.849998
18.966999
3.776
42.25
73.43
0.351
1.778
0.921
BATCH_19
Measurement
microring_Q
0.076
1.64
583.210022
Polymer
3.45
Sputtering
ICP
4.55
No_Anneal
1,538.790039
TE
-6.84
20.73
186.5
18.860001
7.668
3.456
44.900002
74.220001
0.3
1.914
0.815
BATCH_18
Synthetic
OTDR
0.066
1.661
501.600006
Polymer
4.55
PECVD
Wet Etch
3.59
No_Anneal
1,559.25
TM
4.58
73.919998
87.769997
14.19
1.859
0.153
57.09
70.089996
0.414
1.792
0.889
BATCH_19
Measurement
ring_resonance
0.099
1.017
474.429993
Polymer
1.91
PECVD
RIE
1.9
900C_1hr
1,543.089966
TM
-3.29
46.470001
126.339996
9.95
1.92
0.537
56.189999
44.869999
0.118
1.919
0.926
BATCH_39
Measurement
ring_resonance
0.152
1.357
400.119995
Air
1.14
PECVD
Wet Etch
3.08
1000C_1hr
1,554.439941
TM
-1.96
20.309999
189.830002
7.19
2.762
1.253
81.639999
42.849998
0.364
1.622
0.908
BATCH_45
Synthetic
OTDR
0.046
1.998
318.779999
SiO2
1.32
LPCVD
ICP
3.92
No_Anneal
1,568.040039
TE
-2.52
26.889999
83.580002
5.4
2.113
1.794
48.07
58.389999
0.054
1.919
0.806
BATCH_47
Measurement
cut-back
0.089
1.387
560.960022
Polymer
3.59
Sputtering
Wet Etch
4.34
No_Anneal
1,591.23999
TE
7.24
22.32
130.460007
28.129999
4.817
1.098
54.869999
86.080002
0.073
1.987
0.735
BATCH_45
Synthetic
OTDR
0.134
1.017
513.609985
SiO2
2.37
LPCVD
RIE
4.08
900C_3hr
1,524.300049
TM
-4.85
32.880001
99.419998
42.880001
12.361
2.579
43.98
85.510002
0.36
1.586
0.864
BATCH_12
Measurement
microring_Q
0.104
1.282
379.040009
Polymer
3.95
LPCVD
Wet Etch
0.51
900C_3hr
1,558.030029
TM
-8.02
78.650002
111.519997
47.130001
20.554001
3.97
56.43
59.77
0.256
1.748
0.74
BATCH_48
Measurement
ring_resonance
0.017
0.764
467.380005
Polymer
4.21
Sputtering
RIE
3.21
1000C_1hr
1,560.550049
TM
-3.86
57.990002
84.599998
47.77
21.856001
4.195
87.379997
60.18
0.059
1.823
0.923
BATCH_38
Measurement
microring_Q
0.139
1.998
321.859985
Air
2.03
Sputtering
RIE
1.86
No_Anneal
1,570.859985
TM
-2.56
44.450001
53.48
9.19
4.638
4.186
55.68
59.07
0.484
1.875
0.86
BATCH_15
Synthetic
cut-back
0.172
1.309
313.309998
SiO2
3.92
LPCVD
ICP
4.43
900C_3hr
1,516.089966
TE
-7.58
67.93
180.050003
18.610001
5.388
2.258
84.279999
42.41
0.489
1.802
0.751
BATCH_38
Measurement
ring_resonance
0.13
0.915
430.850006
SiO2
4.94
Sputtering
RIE
2.99
900C_3hr
1,543.180054
TE
7.12
41.790001
26.700001
2.93
2.401
4.391
58.669998
40.09
0.252
1.814
0.759
BATCH_10
Measurement
microring_Q
0.078
1.847
528.530029
SiO2
3.58
LPCVD
ICP
4.64
No_Anneal
1,566.040039
TM
-3.43
30.32
81.400002
14.13
6.865
4.004
50.549999
43.470001
0.405
1.928
0.814
BATCH_31
Synthetic
cut-back
0.015
0.782
241.960007
SiO2
2.38
Sputtering
Wet Etch
3.39
No_Anneal
1,531.73999
TE
-2.34
57
159.199997
20.99
7.697
2.949
49.139999
50.84
0.453
1.915
0.837
BATCH_11
Synthetic
ring_resonance
0.095
1.524
368.859985
Polymer
4.85
Sputtering
RIE
3.02
900C_1hr
1,583.609985
TE
8.37
72.580002
99.489998
47.869999
11.033
1.98
72.839996
47.310001
0.068
1.694
0.753
BATCH_9
Synthetic
OTDR
0.069
1.756
550.200012
SiO2
3.17
LPCVD
ICP
3.9
900C_1hr
1,511.869995
TM
9.42
64.559998
68.629997
11.99
2.464
0.646
47.650002
58.299999
0.222
1.889
0.855
BATCH_9
Measurement
cut-back
0.065
0.907
359.179993
Air
4.4
PECVD
Wet Etch
4.65
No_Anneal
1,501.430054
TM
-9.72
36.009998
104
31.66
8.389
2.16
47.59
86.989998
0.011
1.594
0.895
BATCH_19
Synthetic
microring_Q
0.19
1.616
210.100006
Air
2.42
LPCVD
ICP
1.76
1000C_1hr
1,517
TM
-8.85
36.389999
127.32
17.15
4.353
1.934
61
67.709999
0.23
1.61
0.933
BATCH_39
Measurement
ring_resonance
0.044
1.084
239.820007
Polymer
4
Sputtering
RIE
1.54
900C_3hr
1,597.01001
TE
-9.68
39.299999
196.089996
45.849998
10.412
2.151
86.330002
72.059998
0.487
1.794
0.735
BATCH_1
Measurement
ring_resonance
0.036
0.514
404.350006
Air
1.87
Sputtering
Wet Etch
2.78
900C_3hr
1,587.689941
TM
-9.69
39.68
38.209999
16.75
8.78
4.307
41.93
52.639999
0.343
1.861
0.721
BATCH_15
Measurement
microring_Q
0.086
1.38
353.429993
SiO2
1.08
LPCVD
Wet Etch
3.67
900C_1hr
1,501.030029
TE
7.85
23.129999
57.34
40.799999
4.751
0.945
72.120003
60.099998
0.373
1.933
0.881
BATCH_11
Synthetic
microring_Q
0.104
1.57
414.140015
Polymer
3.12
Sputtering
ICP
0.56
900C_3hr
1,540.069946
TE
-9.31
74.269997
131.279999
13.43
6.501
3.963
57.810001
80.690002
0.429
1.774
0.883
BATCH_26
Synthetic
cut-back
0.056
1.231
353.609985
Polymer
4.35
PECVD
ICP
4.45
900C_3hr
1,528.359985
TM
5.61
44.400002
166.929993
4.83
2.177
2.103
79.199997
43.09
0.387
1.782
0.845
BATCH_49
Synthetic
ring_resonance
0.062
0.613
232.039993
Polymer
2.22
Sputtering
ICP
2.05
900C_1hr
1,585.609985
TM
-9.82
77.800003
139.300003
27.469999
6.038
1.774
46.82
46.400002
0.174
1.923
0.937
BATCH_7
Synthetic
microring_Q
0.164
1.389
332.76001
Polymer
3.78
LPCVD
ICP
4.78
No_Anneal
1,525.449951
TM
-0.27
54.849998
193.229996
28.620001
13.063
3.867
61.169998
84.349998
0.097
1.564
0.71
BATCH_7
Measurement
microring_Q
0.013
1.12
417.290009
Air
1.83
Sputtering
RIE
3.77
1000C_1hr
1,588.199951
TE
-0.59
74.910004
60.759998
5.76
3.677
4.472
68.059998
49.639999
0.047
1.769
0.706
BATCH_29
Synthetic
ring_resonance
0.154
0.646
432.779999
Polymer
4.38
PECVD
RIE
1.11
900C_3hr
1,521.569946
TM
-7.11
35.529999
113.129997
5.86
3.12
2.19
41.07
51.139999
0.426
1.661
0.862
BATCH_35
Synthetic
microring_Q
0.098
0.725
200.509995
Polymer
1.96
PECVD
ICP
2.66
900C_3hr
1,501.810059
TM
2.84
73.900002
90.559998
41.040001
2.49
0.152
88.230003
40.740002
0.219
1.643
0.82
BATCH_40
Synthetic
microring_Q
0.192
1.584
387.359985
SiO2
2.76
Sputtering
Wet Etch
2.78
1000C_1hr
1,541.280029
TM
-3.98
44.810001
89.25
44
9.903
2.121
85.75
76.580002
0.464
1.774
0.921
BATCH_44
Synthetic
OTDR
0.028
1.521
578.280029
SiO2
2.39
Sputtering
Wet Etch
1.35
No_Anneal
1,580.540039
TE
6.49
67.779999
115.160004
4.85
3.518
3.486
56
70.309998
0.497
1.625
0.735
BATCH_32
Measurement
cut-back
0.074
1.605
421.320007
Air
3.03
PECVD
RIE
1.1
900C_1hr
1,543.949951
TE
4.33
24.82
149.509995
31.27
8.335
2.151
76.730003
55.27
0.269
1.93
0.877
BATCH_28
Measurement
microring_Q
0.113
0.815
302.049988
Air
2.29
LPCVD
RIE
3.59
900C_1hr
1,544.76001
TE
-2.22
42.990002
138.429993
22.35
11.866
4.479
84.779999
43.919998
0.105
1.589
0.777
BATCH_1
Measurement
microring_Q
0.153
1.934
272.320007
SiO2
2.78
LPCVD
Wet Etch
3.91
1000C_1hr
1,538.780029
TM
-7.55
20.389999
144.190002
33.189999
13.821
3.859
83.93
81.849998
0.264
1.922
0.89
BATCH_33
Synthetic
ring_resonance
0.129
1.441
490.130005
SiO2
2.22
PECVD
Wet Etch
1.09
900C_1hr
1,507.540039
TM
-1.59
66.940002
80.32
7.52
1.109
0.655
73.879997
82
0.304
1.844
0.707
BATCH_39
Measurement
cut-back
0.133
0.989
540.969971
SiO2
4.39
PECVD
ICP
4.34
1000C_1hr
1,524.109985
TE
-1.97
27.65
71.910004
38.919998
8.382
2.021
48.689999
71.410004
0.456
1.775
0.767
BATCH_1
Measurement
cut-back
0.14
0.514
466.779999
Air
2.68
LPCVD
RIE
1.86
900C_3hr
1,530.73999
TE
-3.56
27.549999
99.43
2.07
2.24
4.566
44.450001
59.040001
0.052
1.544
0.918
BATCH_22
Measurement
ring_resonance
0.194
1.24
200.539993
SiO2
1.54
PECVD
Wet Etch
1.81
No_Anneal
1,586.050049
TM
9.36
55.299999
137.399994
12.51
7.302
4.94
63.630001
66.580002
0.221
1.799
0.884
BATCH_20
Measurement
ring_resonance
0.128
1.629
525.210022
Polymer
3.97
LPCVD
Wet Etch
3.27
900C_3hr
1,582.469971
TM
0.87
49.959999
30.02
14.75
8.788
4.896
40.009998
84.550003
0.32
1.706
0.884
BATCH_26
Synthetic
cut-back
0.03
0.676
501.149994
Air
3.87
Sputtering
RIE
2
900C_1hr
1,582.26001
TE
-2.78
78.940002
182.619995
26.58
12.971
4.189
56.84
62.310001
0.011
1.977
0.754
BATCH_41
Synthetic
OTDR
0.116
1.015
387.98999
Polymer
2.76
PECVD
Wet Etch
4.32
900C_3hr
1,558.589966
TM
-0.12
39.060001
85.75
23.940001
13.49
4.921
66.800003
71.269997
0.027
1.648
0.768
BATCH_25
Measurement
ring_resonance
0.161
1.981
500.369995
SiO2
1.45
PECVD
Wet Etch
4.9
900C_3hr
1,515.430054
TE
-5.15
53.77
61.419998
12.96
5.399
2.835
81.720001
86.089996
0.128
1.806
0.865
BATCH_44
Measurement
cut-back
0.113
1.529
202.839996
Polymer
1.75
LPCVD
ICP
1.47
1000C_1hr
1,567.119995
TM
0.01
54.459999
76.400002
19.799999
9.584
4.37
66.580002
87.400002
0.155
1.743
0.853
BATCH_29
Measurement
microring_Q
0.037
0.65
239.919998
Air
4.35
Sputtering
Wet Etch
3.89
No_Anneal
1,579.329956
TM
-3.67
53.049999
105.029999
26.940001
7.314
2.372
41.759998
84.669998
0.172
1.842
0.741
BATCH_10
Synthetic
OTDR
0.104
1.309
355.720001
Polymer
3.61
Sputtering
ICP
2.12
900C_1hr
1,506.140015
TE
-9.38
37.709999
127.330002
39.66
7.538
1.46
49.389999
79.57
0.118
1.647
0.907
BATCH_33
Synthetic
OTDR
0.155
0.717
242.919998
SiO2
4.44
Sputtering
RIE
2.19
No_Anneal
1,564.910034
TM
-9.68
68.5
58.509998
6.2
3.505
3.82
76.209999
76.419998
0.387
1.509
0.829
BATCH_16
Measurement
cut-back
0.063
1.244
242.789993
Polymer
4.2
LPCVD
ICP
0.87
900C_3hr
1,584.349976
TE
-1.94
51.439999
153.279999
8.39
1.615
1.27
81.290001
67.839996
0.018
1.605
0.729
BATCH_14
Measurement
ring_resonance
0.058
1.673
515.090027
Polymer
4.88
LPCVD
Wet Etch
3.39
900C_3hr
1,587.76001
TM
-7.2
75.870003
81.529999
9.51
4.745
3.459
78.300003
44.650002
0.314
1.788
0.829
BATCH_41
Synthetic
ring_resonance
0.198
1.381
401.290009
SiO2
1.34
PECVD
Wet Etch
2.55
900C_1hr
1,556.310059
TM
-2.57
26.07
84.739998
12.22
4.313
2.262
89.040001
55.459999
0.489
1.545
0.877
BATCH_44
Synthetic
microring_Q
0.068
0.986
335.149994
SiO2
1.48
PECVD
Wet Etch
3.35
No_Anneal
1,507.369995
TE
-9.14
22.219999
112.029999
5.12
2.255
1.827
70.230003
59.689999
0.022
1.919
0.878
BATCH_49
Synthetic
ring_resonance
0.059
0.874
577.780029
SiO2
1.79
PECVD
ICP
2.12
No_Anneal
1,539.77002
TE
-4.59
22.98
192.880005
41.599998
9.747
1.945
68.650002
79.699997
0.398
1.922
0.874
BATCH_18
Measurement
ring_resonance
0.118
End of preview. Expand in Data Studio

πŸ’Ž SiN Photonic Waveguide Loss & Efficiency Dataset

πŸ”¬ 90,000 synthetic rows of silicon nitride (Si₃Nβ‚„) waveguide parameters linking geometry, fabrication, and operating conditions to loss and efficiency metrics, for regression modeling, simulation, and fine-tuning.

⚠️ Disclaimer: All rows are synthetically generated. Parameter ranges are informed by published SiN platform values, but no row is a foundry measurement. The data_source column is a schema field; every row in this release is labeled Synthetic.


πŸ“‹ At a Glance

πŸ”’ Rows 90,000
πŸ“Š Columns 25
πŸ§ͺ Material Silicon Nitride (Si₃Nβ‚„)
🎯 Primary Targets propagation_loss, insertion_loss
🧬 Generation Synthetic, parameterized over geometry, process, and operating ranges
🌍 Language English
πŸ“„ License MIT
🏷️ Version 1.1.1

✨ Key Highlights

  • πŸ’Ž Material Focus: Silicon Nitride (Si₃Nβ‚„) on SiOβ‚‚ cladding
  • πŸ“Š 25 Structured Columns: waveguide geometry, fabrication method, operating conditions, and synthetic performance metrics
  • πŸ“¦ 90,000 Rows: sufficient for training and validation splits
  • 🎯 Use Cases:
    • πŸ“ Straight and bent waveguide loss prediction
    • 🏭 Process control and optimization studies
    • πŸ“ Photonic design parameter sensitivity review
    • πŸ” Synthetic data augmentation for smaller measured datasets

πŸ—οΈ Dataset Structure

Each row corresponds to a single waveguide configuration or measurement instance.

πŸ“ Waveguide Geometry

Column Unit Description
waveguide_width Β΅m Core width
waveguide_height nm Core thickness
bend_radius Β΅m Bend radius for curved sections
device_length mm Total device length

🏭 Material & Fabrication

Column Unit Description
cladding_material categorical Cladding material (e.g., SiOβ‚‚)
cladding_thickness Β΅m Cladding layer thickness
deposition_method categorical Core deposition process (e.g., LPCVD, PECVD)
etch_method categorical Etch process (e.g., RIE)
sidewall_roughness nm RMS sidewall roughness
annealing_params string Anneal temperature and duration (e.g., 900C_3hr)

βš™οΈ Operational Parameters

Column Unit Description
wavelength nm Operating wavelength
polarization categorical TE or TM
input_power dBm Launched optical power
temperature Β°C Device temperature

πŸ“ˆ Performance Metrics

Column Unit Description
insertion_loss dB Total device insertion loss
propagation_loss dB/cm Loss per unit length
coupling_efficiency_input % Input coupling efficiency
coupling_efficiency_output % Output coupling efficiency
scattering_loss dB/cm Scattering contribution to loss (independently sampled; not derived from sidewall_roughness)
effective_index dimensionless Modal effective index
mode_confinement_factor 0 to 1 Fraction of modal power in the core

🏷️ Metadata

Column Unit Description
batch_id string Fabrication batch or wafer identifier
data_source categorical Schema field for provenance; all rows in this release are Synthetic
measurement_method categorical Simulated measurement technique (e.g., cut-back, ring_resonance)
uncertainty dB or % Nominal uncertainty on the primary metric

πŸ” Example Row

waveguide_width                = 1.212
waveguide_height               = 400.00
cladding_material              = SiO2
cladding_thickness             = 2.50
deposition_method              = LPCVD
etch_method                    = RIE
sidewall_roughness             = 2.05
annealing_params               = 900C_3hr
wavelength                     = 1452.23
polarization                   = TE
input_power                    = 0.00
temperature                    = 25.00
bend_radius                    = 50.00
device_length                  = 10.00
insertion_loss                 = 3.50
propagation_loss               = 0.300
coupling_efficiency_input      = 72.00
coupling_efficiency_output     = 68.00
scattering_loss                = 0.15
effective_index                = 1.800
mode_confinement_factor        = 0.80
batch_id                       = BATCH_12
data_source                    = Synthetic
measurement_method             = cut-back
uncertainty                    = 0.05

πŸ’‘ Usage

πŸš€ Load the Dataset

from datasets import load_dataset

dataset = load_dataset("Taylor658/SiN-photonic-waveguide-loss-efficiency", split="train")
print(dataset[0])

🐼 Explore with pandas

import pandas as pd

df = dataset.to_pandas()
print(df.describe())

🎯 Regression Example

Treat geometry, fabrication, and operating columns as features and propagation_loss or insertion_loss as the target:

features = df[[
    "waveguide_width", "waveguide_height", "sidewall_roughness",
    "wavelength", "polarization", "temperature"
]]
target = df["propagation_loss"]

# Encode categorical columns, then fit a regression model (scikit-learn, XGBoost, etc.)

πŸ”— Companion Resources


⚠️ Limitations

🧬 Synthetic Content

  • Parameter ranges are informed by published SiN platform values, but actual values vary by foundry, tool set, and process
  • No row is a measured device

πŸ“ Physics Simplifications

  • Not all real-world correlations are captured; effects such as stress-induced birefringence, N-H absorption near 1520 nm, and wavelength-dependent index dispersion may not be modeled
  • scattering_loss and sidewall_roughness are independently sampled; the physical dependence between them is not modeled

πŸ“ Measurement Realism

  • The uncertainty column is a nominal value and does not reproduce real measurement artifacts (facet variation, alignment drift, detector noise)
  • measurement_method is a label; no measurement was performed

🚫 Not for Process Qualification

  • Predictions trained on this data must be validated against measured devices before informing fabrication decisions

πŸ“„ License

Released under the MIT License. You may modify, distribute, and use it for commercial or non-commercial purposes with attribution.


πŸ™Œ Citation

@misc{sin_waveguide_loss_efficiency_2026,
  title  = {SiN Photonic Waveguide Loss \& Efficiency Dataset (Synthetic)},
  author = {Taylor, A.},
  year   = {2026},
  howpublished = {\url{https://huggingface.co/datasets/Taylor658/SiN-photonic-waveguide-loss-efficiency}}
}

πŸ§‘β€πŸ’» Contributing

  • πŸ’¬ Open a Discussion to propose additional process parameters, cladding materials, or loss mechanisms

πŸ‘¨β€πŸš€ Author: A Taylor Β· πŸ€— Hugging Face: hf.co/Taylor658 Β· πŸ™ GitHub: ATaylorAerospace

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